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From the pioneer in robust, engineered EUV systems

Good news: you no longer have to dedicate your laboratory resources to building a high harmonic generation (HHG) system. The 4th generation of KMLabs' XUUS™ extreme UV ultrafast source is a turnkey system that gets you right into your experiment. XUUS4 is a coherent EUV/soft X-ray light source based on high harmonic generation. It is a fully-engineered and integrated commercial source based on a single robust opto-mechanical platform. 

XUUS4 upconverts ultrafast laser pulses into the Extreme UV (EUV or XUV) or soft X-ray regions of the spectrum. Employing HHG processes, the output beam inherits the coherent properties of a driving laser such as the KMLabs RAEA with wavelengths that can be tuned from ~10 to 47 nm. Moreover, customized systems can generate coherent beams with wavelengths as short as 6.5 nm. XUUS4 employs KMLabs' patented hollow waveguide for the high harmonic up-conversion process.

The XUUS hollow-core fiber, or waveguide, architecture enables harmonics generated by the system to be distinguished from other HHG methods, guaranteeing your harmonics originate from the same point in space every time, minimizing any pointing drift. This optimizes repeatability for your experiments. Additionally, the use of a fiber rather than typical gas jet or semi-infinite gas cell target geometries provides superior pressure tunability for phase-matched HHG. Now you can choose robustness without sacrificing flexibility.

Applications:

  • Photoemission: tr-ARPES & attosecond materials science
  • Metrology for nanoelectrics and in support of EUV lithography
  • High-resolution and time-resolved lensless nanoimaging
  • Ultrafast magnetic materials & spintronics studies
  • High spatial and temporal resolution pump-probe studies of magnetic, materials, molecular, and nanosystems dynamics
  • Molecular dynamics and attoscience
XUUS_applications

Features that achieve significant benefits:

  • Patented high harmonic conversion in a waveguide for optimum conversion, stability, repeatability and robustness
  • EUV flux can exceed > 1×1012 ph/sec for the most demanding applications
  • Ultrastable, 4-axis active stabilization of the beam, generating an EUV beam intensity and wavefront stability comparable to visible-IR lasers
  • High average power handling capability driving next generation experiments
  • Diagnostic cameras for performance monitoring and alignment control
  • Graphical, intuitive software control
  • Stable, industrial optical mounting on a temperature-stabilized platform
  • A growing family of application-specific beamlines delivering photons tailored to your experiment
  • Highly coherent, laser-like EUV (XUV) / SXR
  • Custom XUUS systems to generate soft X-rays to wavelengths ~6 nm
  • Waveguide design allows efficient use of high-pressure gas with minimum gas usage:1000x less than a gas jet geometry and up to 100x greater efficiency
  • XUUS output can be optimized for different applications: ARPES, imaging, transient absorption, MOKE, XMCD
Wavelength Flux Repetition Rate Pointing Stability Power Stability
30 nm >5x1012 ph/sec per harmonic 1 - 20 <5µRAD [RMS] <5% [RMS]
13 nm >1010 ph/sec per harmonic 1 - 10 <5µRAD [RMS <5% [RMS]
6 nm >106 ph/sec per 10% BW 1 <10µRAD [RMS <10% [RMS]

Featured Applications:

KMLabs’ XUUS Source Enables 1st sub-wavelength EUV 13.5nm imaging

Wide Field-of-View Reflection-Mode Ptychographic Imaging Microscope with Tabletop 12.7 nm High Harmonic Illumination

High Harmonic Generation

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