KMLabs' 13nm XUUS is the HHG source used for the printing of 20nm pitch line/spaces using interference lightographic imaging of an Inpria metal-oxide resist under high-NA conditions.
KMLabs' 13nm XUUS is the HHG source used for the printing of 20nm pitch line/spaces using interference lightographic imaging of an Inpria metal-oxide resist under high-NA conditions.
KMLabs' XUUS is the EUV source for the world’s first EUV imaging reflectometer
A unique and versatile phase-sensitive imaging reflectometry technique uses KMLabs’ EUV source. This work represents a fundamentally new and useful approach for imaging nanostructures and nanomaterials.
KMLabs' Hyperion VUV was featured by Prof. Katherina Kohse-Hoinghaus in the opening lecture of 38th International Symposium on Combustion (1/25-1/29/2021 Adelaide, Australia) as one of the three promising combustion technologies!
For the last 25+ years, KMLabs research and development in high harmonic generation has brought vacuum ultraviolet, extreme ultraviolet, and soft x-ray laser-like radiation on a tabletop scale.
KMLabs is a vibrant and fast-growing company that has developed a unique range of high technology laser products. KMLabs is the technology leader for high power, highest performance femtosecond laser systems and the market definer for tabletop-scale coherent EUV and x-ray sources.
KMLabs delivers record performance ultrafast Ti:sapphire and EUV systems that are designed and engineered for each application. With the new Intel-Capital led investment, KMLabs moved to a new manufacturing facility in Boulder, with state-of-the-art engineering and production. KMLabs is the leader in ultrafast laser and x-ray science, having brought the first 10fs lasers and coherent EUV sources to market.
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Laser-like EUV on a tabletop enabled by combining the KMLabs XUUS with a high-power Ti:Sapphire amplifier.
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