KMLabs Pantheon™ platform is a pulsed EUV source, consisting of the necessary
instrumentation for the generation of EUV light as well as a beamline to facilitate delivery of pure EUV photons to your user-supplied experimental station. Individual pulses of light from Pantheon have duration in the femtosecond regime and take the form of a laser-like, coherent, and highly focusable beam.
From nanoscale imaging to ultrafast magnetization dynamics, photoemission spectroscopy, and semiconductor lithography, a multitude of materials and technologies have characteristic energy or transitions that fall in this critical range. Harnessing the power of this portion of the spectrum is now possible in a laboratory setting for scientists who want to focus on the experiment rather than the light source.
Generation of EUV photons is accomplished by the high harmonic generation process, using an ultrafast 800 nm beam as the fundamental light source. Downstream of the high harmonic process, Pantheon includes the necessary optics to remove the fundamental light from the propagating beam, leaving only the converted EUV light for the experiment. However, excess fundamental light can also be directed down an alternative beam path(s) to use in a separate experiment, or to facilitate IR/EUV pump-probe measurements.
Learn how the Pantheon EUV source can enable new capabilities in your lab by navigating to our Applications web page.