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Our very own, Dan Hickstein (Product Manager of the Hyperion VUV Laser System) and Seth Cousin (Director of Products) have CLEO talks on May 13th and 14th during the virtual technical sessions.  Please join online to learn the latest in the generation of coherent VUV lasers beams by registering here.  If you want to hear how imec plans to use their tabletop scale Pantheon EUV Laser System to power the new attolab, click here

 

Seth's talk: https://event.crowdcompass.com/cleo20/activity/Tnze5i1v7h (Thursday, May 14th, 9:45 am)

A Laboratory Light Source for Ultrafast Kinetics of EUV Exposure Processes and Ultra-Small Pitch Lithography

Abstract:  An ultra-short pulsed, ultra-broadband (~13nm-~13µm) light-source has been developed to drive atto- to femto- second time-resolved studies on EUV photo-resist materials. The same source will also be used to investigate EUV driven nano-lithography.

Speaker:  Seth Cousin (KMLabs)

AuthorsS. Cousin, C. Bargsten, E. Rinard, R. Ward, E. Hosler, B. Petersen, H. Kapteyn, KM Labs| P. Vanelderen, J. Petersen, P. van der Heide, imec

Access the Technical PaperDownload PDF (Login Required – Available to Technical Attendees Only)

 

 

Dan's talk:  https://event.crowdcompass.com/cleo20/activity/bGdL5LMYJ0  (Wednesday, May 13th, 6:30 pm)

A Compact MHz-repetition-rate VUV Source: Implementation, Modeling, and Applications

Abstract:  Utilizing highly cascaded harmonic generation, we upconvert a MHz fiber laser to the vacuum ultraviolet (up to 18~eV). We apply the source to combustion-chemistry experiments and conduct numerical simulation to understand the nonlinear generation process

Speaker:  Dan Hickstein (KMLabs)

AuthorsD. Hickstein, M. Kirchner, S. Domingue, J. Ramirez, B. Peterson, S. Backus, KMLabs| D. Couch, b. Ellison, N. Labbe, M. Murnane, H. Kapteyn, University of Colorado

Access the Technical PaperDownload PDF (Login Required – Available to Technical Attendees Only)

 

 

Filled under: High Harmonic, XUUS, Ti:Sapphire, HHG, Coherent Diffractive Imaging, Mask Inspection, Semiconductor, EUV, imaging, lithography, nanoscale characterization, photoresist, semiconductor technology, attolab, imec, VUV, ARPES, time-resolved ARPES, PIM, chemical combustion, extreme ultraviolet source, nanostructures, materials characterization, quantum, spectroscopy, ultrafast spectroscopy, highly cascaded harmonic generation

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