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EUV-Colloidal Talbot Lithography

September 23, 2026

EUV coherent Talbot lithography (CTL) uses the self-imaging of diffracted light to create periodic structures with features smaller than those of the initial pattern. Beyond conventional transmission...

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KMLabs' XUUS™-5 integrated in-situ with Spectra-Physics Solstice® Ace™ delivers high-flux 30-120 eV EUV photons

July 7, 2021

Using a Spectra-Physics Solstice Ace Ti:sapphire-based femtosecond amplifier and a KMLabs’ XUUS-5 high-harmonic-generation system we demonstrate a high flux, stable, coherent EUV light source with...

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KMLabs' XUUS-5 high harmonic source delivers exceptional performance when driven directly by Light Conversion's PHAROS laser

May 6, 2021

Using Light Conversion’s industrial-grade PHAROS femtosecond laser and KMLabs’ XUUSTM-5 high-harmonic-generation system we demonstrate a high flux, ultrastable, coherent EUV light source with photon...

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World's first phase-sensitive EUV imaging reflectometer on 3D nanostructure characterization

February 1, 2021

KMLabs, STROBE Science and Technology Center at CU Boulder, and imec's Attolab have worked collaboratively to present the world's first phase-sensitive extreme ultraviolet (EUV) imaging reflectometer.

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